The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Sep. 20, 2019
Applicant:

Jx Advanced Metals Corporation, Tokyo, JP;

Inventors:

Daiki Shono, Ibaraki, JP;

Shuhei Murata, Ibaraki, JP;

Takeo Okabe, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); B21J 1/02 (2006.01); B21J 5/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); B21J 1/025 (2013.01); B21J 5/008 (2013.01);
Abstract

Provided is a cylindrical sputtering target made of a metal material, which has reduced particles. The sputtering target includes at least a target material, wherein the target material comprises one or more metal elements, the target material has a crystal grain size of 50 μm or less, and the target material has an oxygen concentration of 1000 ppm by mass or less.


Find Patent Forward Citations

Loading…