The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2026

Filed:

Apr. 20, 2021
Applicant:

Jx Nippon Mining & Metals Corporation, Tokyo, JP;

Inventors:

Akira Miura, Hitachi, JP;

Ronny Winarko, Vancouver, CA;

Wenying Liu, Vancouver, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22B 3/02 (2006.01); C22B 3/08 (2006.01); C22B 15/00 (2006.01);
U.S. Cl.
CPC ...
C22B 3/02 (2013.01); C22B 3/08 (2013.01); C22B 15/0071 (2013.01);
Abstract

Provided is a method for efficiently promoting a leaching reaction of copper. Equipment for leaching copper includes a reactor for leaching reaction and a controller for oxidation-reduction potential. The reactor is configured to be provided with a leaching solution containing iodine and iron. The reactor is configured to be capable of being tightly sealed during the leaching reaction. The controller for oxidation-reduction potential is configured so that, during the leaching reaction, the oxidation-reduction potential of the leaching solution can be maintained at 500 mV (based on Ag/AgCl reference) or higher.


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Miura, Akira. (2026). Equipment and method for leaching copper, and method for producing electrolytic copper using said equipment and method (U.S. Patent No. 12612677). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12612677

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