The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Sep. 23, 2022
Applicant:
Jx Advanced Metals Corporation, Tokyo, JP;
Inventors:
Assignee:
JX Advanced Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/16 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); G11B 5/65 (2006.01); G11B 5/706 (2006.01); G11B 5/735 (2006.01); G11B 5/851 (2006.01); H01F 41/18 (2006.01); G11B 5/73 (2006.01);
U.S. Cl.
CPC ...
C23C 14/165 (2013.01); C23C 14/083 (2013.01); C23C 14/3407 (2013.01); G11B 5/658 (2021.05); G11B 5/70621 (2013.01); G11B 5/7353 (2019.05); G11B 5/851 (2013.01); H01F 41/18 (2013.01); G11B 5/73919 (2019.05); G11B 5/73921 (2019.05);
Abstract
A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains NbOas a metal oxide component.
Quick Actions:
Shimizu, Masayoshi. (2025). Sputtering target (U.S. Patent No. 12312674). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12312674
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