For the Inventor, By the Inventor

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Santa Clara, CA, United States of America

Euv LLC.

USPTO Granted Patents = 75

% Expired Patents = 4.0

Forward Citations = 871

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57 inventors (with patents filed for the assignee):

Leonard Elliott Klebanoff (19 out of 28 patents)

William C Sweatt (10 out of 49 patents)

Steven Julian Haney (9 out of 12 patents)

4. Daniel A Tichenor (7 out of 7 patents)

5. Glenn D Kubiak (7 out of 8 patents)

6. Patrick P Naulleau (7 out of 20 patents)

7. Avijit K Ray-Chaudhuri (7 out of 7 patents)

8. Daniel John Rader (7 out of 17 patents)

9. Kurt W Berger (5 out of 5 patents)

10. Donald W Sweeney (5 out of 11 patents)

11. Donald Joe Herron (5 out of 5 patents)

12. William C Replogle (5 out of 6 patents)

13. Paul Andrew Spence (4 out of 4 patents)

14. Daniel G Stearns (3 out of 34 patents)

15. Michael P Kanouff (3 out of 6 patents)

Core Competencies:

EUV Lithography

Optics Protection

Debris Mitigation

Multilayer Coating

Reticle Stage

Mirror Tilt Stage

Holographic Illuminator

Radiation Source

Mask Fabrication

Thin Layer Imaging

Self-Cleaning Optics

Vacuum Chamber

75 patents: Sort by Forward Citations

1. 7740916 - Method for the protection of extreme ultraviolet lithography optics (2010-06-22),

2. 7662263 - Figure correction of multilayer coated optics (2010-02-16),

3. 7473301 - Adhesive particle shielding (2009-01-06),

4. 7273289 - Vacuum compatible, high-speed, 2-D mirror tilt stage (2007-09-25),

5. 7239443 - Condenser optic with sacrificial reflective surface (2007-07-03),

6. 7196771 - Reticle stage based linear dosimeter (2007-03-27),

7. 7147722 - Method for in-situ cleaning of carbon contaminated surfaces (2006-12-12),

8. 7081992 - Condenser optic with sacrificial reflective surface (2006-07-25),

9. 7049033 - EUV lithography reticles fabricated without the use of a patterned absorber (2006-05-23),

10. 7034322 - Fluid jet electric discharge source (2006-04-25),

11. 7027226 - Diffractive optical element for extreme ultraviolet wavefront control (2006-04-11),

12. 7016030 - Extended surface parallel coating inspection method (2006-03-21),

13. 6989629 - Method and apparatus for debris mitigation for an electrical discharge source (2006-01-24),

14. 6927887 - Holographic illuminator for synchrotron-based projection lithography systems (2005-08-09),

15. 6906781 - Reticle stage based linear dosimeter (2005-06-14),

Euv LLC, based in Santa Clara, CA, specializes in advanced technologies related to Extreme Ultraviolet (EUV) lithography. The company focuses on developing solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes. Key areas of expertise include optics protection, debris mitigation, multilayer coatings, and precision components such as reticle and mirror tilt stages. Euv LLC is dedicated to advancing the capabilities of EUV lithography, contributing to the evolution of high-performance electronic devices.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

75 Patents

#52 in Santa Clara, CA

#1,154 in California

#4,906 in US

#10,007 in the World

Santa Clara, CA, United States of America

Euv LLC.

Forward Citations = 871

57 inventors:

Leonard Elliott Klebanoff (19 out of 28 patents)

William C Sweatt (10 out of 49 patents)

Steven Julian Haney (9 out of 12 patents)

4. Daniel A Tichenor (7 out of 7 patents)

5. Glenn D Kubiak (7 out of 8 patents)

Please report any incorrect information to [email protected]

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