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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Euv LLC.


USPTO Granted Patents = 75

Forward Citations = 867

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57 inventors (with patents filed for the assignee):

goldMedal Leonard Elliott Klebanoff (19 out of 28 patents)

silverMedal William C Sweatt (10 out of 49 patents)

bronzeMedal Steven Julian Haney (9 out of 12 patents)

4.  Daniel A Tichenor (7 out of 7 patents)

5.  Glenn D Kubiak (7 out of 8 patents)

6.  Patrick P Naulleau (7 out of 20 patents)

7.  Avijit K Ray-Chaudhuri (7 out of 7 patents)

8.  Daniel John Rader (7 out of 17 patents)

9.  Kurt W Berger (5 out of 5 patents)

10.  Donald W Sweeney (5 out of 11 patents)

11.  Donald Joe Herron (5 out of 5 patents)

12.  William C Replogle (5 out of 6 patents)

13.  Paul Andrew Spence (4 out of 4 patents)

14.  Daniel G Stearns (3 out of 34 patents)

15.  Michael P Kanouff (3 out of 6 patents)


Core Competencies:
Extreme Ultraviolet Lithography
Optical Coatings
Debris Mitigation
Holographic Illuminators
EUV Reticles
Mirror Tilt Stages
Carbon Contamination Cleaning
Radiation Sources
Microlithography
Photolithography Systems
Diffraction Filters
Mask Protection

75 patents:

1. 7740916 - Method for the protection of extreme ultraviolet lithography optics (2010-06-22),
2. 7662263 - Figure correction of multilayer coated optics (2010-02-16),
3. 7473301 - Adhesive particle shielding (2009-01-06),
4. 7273289 - Vacuum compatible, high-speed, 2-D mirror tilt stage (2007-09-25),
5. 7239443 - Condenser optic with sacrificial reflective surface (2007-07-03),
6. 7196771 - Reticle stage based linear dosimeter (2007-03-27),
7. 7147722 - Method for in-situ cleaning of carbon contaminated surfaces (2006-12-12),
8. 7081992 - Condenser optic with sacrificial reflective surface (2006-07-25),
9. 7049033 - EUV lithography reticles fabricated without the use of a patterned absorber (2006-05-23),
10. 7034322 - Fluid jet electric discharge source (2006-04-25),
11. 7027226 - Diffractive optical element for extreme ultraviolet wavefront control (2006-04-11),
12. 7016030 - Extended surface parallel coating inspection method (2006-03-21),
13. 6989629 - Method and apparatus for debris mitigation for an electrical discharge source (2006-01-24),
14. 6927887 - Holographic illuminator for synchrotron-based projection lithography systems (2005-08-09),
15. 6906781 - Reticle stage based linear dosimeter (2005-06-14),
EUV LLC. is a dynamic technology company specializing in extreme ultraviolet (EUV) lithography solutions. We provide cutting-edge EUV equipment for semiconductor manufacturers and research institutions worldwide. Our innovative solutions enable the production of high-performance chips with unmatched precision and efficiency. With a team of industry experts and a commitment to continuous innovation, EUV LLC. is at the forefront of transforming the semiconductor industry.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Jan 13 2026

75 Patents

#71 in Santa Clara, CA

#1,130 in California

#4,734 in US

#9,739 in the World

...
Santa Clara, CA, United States of America

Euv LLC.

Forward Citations = 867

57 inventors:

goldMedal Leonard Elliott Klebanoff (19 out of 28 patents)

silverMedal William C Sweatt (10 out of 49 patents)

bronzeMedal Steven Julian Haney (9 out of 12 patents)

4.  Daniel A Tichenor (7 out of 7 patents)

5.  Glenn D Kubiak (7 out of 8 patents)

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