For the Inventor, By the Inventor

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Santa Clara, CA, United States of America

Euv LLC.

USPTO Granted Patents = 75

% Expired Patents = 4.0

Forward Citations = 871

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57 inventors (with patents filed for the assignee):

Leonard Elliott Klebanoff (19 out of 28 patents)

William C Sweatt (10 out of 49 patents)

Steven Julian Haney (9 out of 12 patents)

4. Daniel A Tichenor (7 out of 7 patents)

5. Glenn D Kubiak (7 out of 8 patents)

6. Patrick P Naulleau (7 out of 20 patents)

7. Avijit K Ray-Chaudhuri (7 out of 7 patents)

8. Daniel John Rader (7 out of 17 patents)

9. Kurt W Berger (5 out of 5 patents)

10. Donald W Sweeney (5 out of 11 patents)

11. Donald Joe Herron (5 out of 5 patents)

12. William C Replogle (5 out of 6 patents)

13. Paul Andrew Spence (4 out of 4 patents)

14. Daniel G Stearns (3 out of 34 patents)

15. Michael P Kanouff (3 out of 6 patents)

Core Competencies:

EUV Lithography

Optics Protection

Debris Mitigation

Multilayer Coating

Reticle Stage

Mirror Tilt Stage

Holographic Illuminator

Radiation Source

Mask Fabrication

Thin Layer Imaging

Self-Cleaning Optics

Vacuum Chamber

75 patents: Sort by Forward Citations

1. 7740916 - Method for the protection of extreme ultraviolet lithography optics (2010-06-22),

2. 7662263 - Figure correction of multilayer coated optics (2010-02-16),

3. 7473301 - Adhesive particle shielding (2009-01-06),

4. 7273289 - Vacuum compatible, high-speed, 2-D mirror tilt stage (2007-09-25),

5. 7239443 - Condenser optic with sacrificial reflective surface (2007-07-03),

6. 7196771 - Reticle stage based linear dosimeter (2007-03-27),

7. 7147722 - Method for in-situ cleaning of carbon contaminated surfaces (2006-12-12),

8. 7081992 - Condenser optic with sacrificial reflective surface (2006-07-25),

9. 7049033 - EUV lithography reticles fabricated without the use of a patterned absorber (2006-05-23),

10. 7034322 - Fluid jet electric discharge source (2006-04-25),

11. 7027226 - Diffractive optical element for extreme ultraviolet wavefront control (2006-04-11),

12. 7016030 - Extended surface parallel coating inspection method (2006-03-21),

13. 6989629 - Method and apparatus for debris mitigation for an electrical discharge source (2006-01-24),

14. 6927887 - Holographic illuminator for synchrotron-based projection lithography systems (2005-08-09),

15. 6906781 - Reticle stage based linear dosimeter (2005-06-14),

EUV LLC. is a dynamic technology company specializing in extreme ultraviolet (EUV) lithography solutions. We provide cutting-edge EUV equipment for semiconductor manufacturers and research institutions worldwide. Our innovative solutions enable the production of high-performance chips with unmatched precision and efficiency. With a team of industry experts and a commitment to continuous innovation, EUV LLC. is at the forefront of transforming the semiconductor industry.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 15 2026

75 Patents

#51 in Santa Clara, CA

#1,150 in California

#4,895 in US

#9,984 in the World

Santa Clara, CA, United States of America

Euv LLC.

Forward Citations = 871

57 inventors:

Leonard Elliott Klebanoff (19 out of 28 patents)

William C Sweatt (10 out of 49 patents)

Steven Julian Haney (9 out of 12 patents)

4. Daniel A Tichenor (7 out of 7 patents)

5. Glenn D Kubiak (7 out of 8 patents)

Please report any incorrect information to [email protected]

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