Company Filing History:
Years Active: 2000-2007
Title: Kurt W. Berger: Innovator in Photolithography Technology
Introduction
Kurt W. Berger is a notable inventor based in Livermore, California, recognized for his contributions to the field of photolithography. With a total of five patents to his name, he has made significant advancements in the measurement of extreme ultraviolet (EUV) intensity.
Latest Patents
One of his latest patents is the Reticle Stage Based Linear Dosimeter. This innovative detector employs a linear array of photodiodes to measure EUV intensity. The design is particularly suited for photolithography systems and includes several key components: a ringfield camera, a source of radiation, and a condenser that processes radiation to produce a ringfield illumination field for illuminating a mask. The reticle is positioned at the ringfield camera's object plane, reflecting an intensity profile into the entrance pupil of the camera. The reticle moves transversely to the length of the illumination field, allowing for comprehensive measurement of the intensity projected onto the reticle. Finally, the reticle image is projected onto a wafer from the ringfield camera.
Career Highlights
Throughout his career, Kurt W. Berger has worked with various companies, including EUV LLC and EUV, L.L.C. His experience in these organizations has contributed to his expertise in photolithography and related technologies.
Collaborations
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Conclusion
Kurt W. Berger's innovative work in photolithography and his patented technologies demonstrate his significant impact on the field. His contributions continue to influence advancements in EUV measurement and photolithography systems.