The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Apr. 05, 2004
Philip A. Grunow, San Leandro, CA (US);
Wayne M. Clift, Tracy, CA (US);
Leonard E. Klebanoff, San Clemente, CA (US);
Philip A. Grunow, San Leandro, CA (US);
Wayne M. Clift, Tracy, CA (US);
Leonard E. Klebanoff, San Clemente, CA (US);
EUV LLC., Santa Clara, CA (US);
Abstract
A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 Å thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PHand HS. The use of PHand HS is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 Å thick in a vacuum atmosphere such as found in an EUVL machine.