Location History:
- Livermore, CA (US) (2004 - 2006)
- San Leandro, CA (US) (2010)
Company Filing History:
Years Active: 2004-2010
Title: Innovations of Philip A. Grunow
Introduction
Philip A. Grunow is a notable inventor based in San Leandro, CA (US). He has made significant contributions to the field of extreme ultraviolet lithography and has been awarded 3 patents for his innovative methods and devices. His work focuses on enhancing the performance and longevity of optical surfaces used in advanced lithography systems.
Latest Patents
Grunow's latest patents include a method for the protection of extreme ultraviolet lithography optics. This innovative coating protects optical surfaces exposed to high-energy erosive plasma. The method involves injecting a gas, such as xenon plasma, into the EUVL machine, which decomposes and coats the optical surfaces with a protective layer. The coating is maintained at a thickness of less than about 100 Å by periodic gas injections. Additionally, he has developed a method for in-situ cleaning of carbon contaminated surfaces. This method utilizes activated gaseous species generated adjacent to the contaminated surface to facilitate cleaning. The device designed for this purpose includes a vacuum chamber, a source of gaseous species, and a source of electrons to activate the gaseous species.
Career Highlights
Grunow's career is marked by his dedication to advancing lithography technology. His innovative approaches have significantly improved the efficiency and effectiveness of photolithography systems. His work is particularly relevant in industries that rely on precision optics and high-performance lithography.
Collaborations
Throughout his career, Grunow has collaborated with esteemed colleagues, including Leonard Elliott Klebanoff and Samuel Graham, Jr. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in the field.
Conclusion
Philip A. Grunow's contributions to the field of extreme ultraviolet lithography demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges faced in lithography and offer practical solutions to enhance optical performance. His work continues to influence the industry and pave the way for future advancements.