Albuquerque, NM, United States of America

Daniel John Rader


Average Co-Inventor Count = 3.0

ph-index = 10

Forward Citations = 292(Granted Patents)


Location History:

  • Lafayette, CA (US) (2000 - 2001)
  • Albuquerque, NM (US) (1996 - 2016)

Company Filing History:


Years Active: 1996-2016

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17 patents (USPTO):Explore Patents

Title: **The Innovative Mind of Daniel John Rader**

Introduction

Daniel John Rader, an accomplished inventor based in Albuquerque, NM, has made significant contributions to the realm of extreme ultraviolet (EUV) technology. With a remarkable portfolio of 17 patents, Rader's work showcases his dedication to advancing innovation in the optical and semiconductor industries.

Latest Patents

Among his latest inventions, Rader has developed groundbreaking methodologies and apparatuses for use with EUV light that come equipped with contamination protection. One of his notable patents describes an apparatus that comprises a duct with multiple openings and an optical component designed to manipulate EUV light effectively. This invention also features a source of low-pressure gas that ensures the EUV light's high transmission while maintaining a clean operating environment.

Another significant patent focuses on particle control near reticles and optics utilizing a novel design of showerheads. This method provides clean gas flows to safeguard the integrity of the reticle surface during EUV reticle inspection. By employing porous metal diffusers, Rader's technique isolates the reticle from unwanted particles and chemicals, ensuring a pristine workflow in semiconductor manufacturing.

Career Highlights

Rader has held esteemed positions in various reputable organizations, such as EUV LLC and Sandia Corporation. His experiences in these companies have allowed him to refine his skills and contribute thoughtfully to the innovation landscape, especially in the realm of high-precision optical systems.

Collaborations

Throughout his career, Rader has collaborated with notable colleagues, including Leonard Elliott Klebanoff and John R. Torczynski. These partnerships in research and development have played a crucial role in enhancing the effectiveness and applicability of his inventions.

Conclusion

Daniel John Rader exemplifies what it means to be a pioneering inventor. His dedication to advancing EUV technology and particle control systems not only underscores his expertise but also significantly impacts the field of optics and semiconductor manufacturing. Rader's work continues to inspire future innovations, ensuring that the industry moves forward with cleaner and more precise technologies.

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