Euv Llc.

Sandia Corporation

Kla Tencor Corporation

Other

Applied Materials, Inc.

Sandia National Laboratories

Buv LLC

Daniel John Rader

Leonard Elliott Klebanoff

John R Torczynski

Anthony S Geller

John E Brockmann

Gildardo Rios Delgado

Rudy Flores Garcia

William T Silfvast

Karl Wally

Michail A Gallis

Madhavi R Chandrachood

Steve G Ghanayem

Khanh B Nguyen

James Allen Folta

Frank Chilese

Scott Daniel Hector

Christopher E Walton

Francis Chilese

Richard H Stulen

Thomas W Grasser

Ronald C Dykhuizen

Jaime N Castaneda

Nancy Cantwell

An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

Methods and apparatus for use with extreme ultraviolet light having contamination protection

A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.

Particle control near reticle and optics using showerhead

An efficient device for capturing fast moving particles has an adhesive particle shield that includes (i) a mounting panel and (ii) a film that is attached to the mounting panel wherein the outer surface of the film has an adhesive coating disposed thereon to capture particles contacting the outer surface. The shield can be employed to maintain a substantially particle free environment such as in photolithographic systems having critical surfaces, such as wafers, masks, and optics and in the tools used to make these components, that are sensitive to particle contamination. The shield can be portable to be positioned in hard-to-reach areas of a photolithography machine. The adhesive particle shield can incorporate cooling means to attract particles via the thermophoresis effect.

Adhesive particle shielding

Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.

Method and apparatus for debris mitigation for an electrical discharge source

An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of particle collection, classification, concentration (enrichment), an characterization processes onto a single substrate or layered stack of such substrates. By mounting a UV laser diode laser light source on the substrate, or substrates tack, so that it is located down-stream of the sample inlet port and at right angle the sample particle stream, the UV light source can illuminate individual particles in the stream to induce a fluorescence response in those particles having a fluorescent signature such as biological particles, some of said particles. An illuminated particle having a fluorescent signal above a threshold signal would trigger a sorter module that would separate that particle from the particle stream.

Apparatus to collect, classify, concentrate, and characterize gas-borne particles

A removable pellicle for a lithographic mask that provides active and robust particle protection, and which utilizes a traditional pellicle and two deployments of thermophoretic protection to keep particles off the mask. The removable pellicle is removably attached via a retaining structure to the mask substrate by magnetic attraction with either contacting or non-contacting magnetic capture mechanisms. The pellicle retaining structural is composed of an anchor piece secured to the mask substrate and a frame member containing a pellicle. The anchor piece and the frame member are in removable contact or non-contact by the magnetic capture or latching mechanism. In one embodiment, the frame member is retained in a floating (non-contact) relation to the anchor piece by magnetic levitation. The frame member and the anchor piece are provided with thermophoretic fins which are interdigitated to prevent particles from reaching the patterned area of the mask. Also, the anchor piece and mask are maintained at a higher temperature than the frame member and pellicle which also prevents particles from reaching the patterned mask area by thermophoresis. The pellicle can be positioned over the mask to provide particle protection during mask handling, inspection, and pumpdown, but which can be removed manually or robotically for lithographic use of the mask.

Removable pellicle for lithographic mask protection and handling

An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of aerosol collection, classification, concentration (enrichment), and characterization processes onto a single substrate or layered stack of such substrates. By taking advantage of modern micro-machining capabilities, an entire suite of discrete laboratory aerosol handling and characterization techniques can be combined in a single portable device that can provide a wealth of data on the aerosol being sampled. The ALOC offers parallel characterization techniques and close proximity of the various characterization modules helps ensure that the same aerosol is available to all devices (dramatically reducing sampling and transport errors). Micro-machine fabrication of the ALOC significantly reduces unit costs relative to existing technology, and enables the fabrication of small, portable ALOC devices, as well as the potential for rugged design to allow operation in harsh environments. Miniaturization also offers the potential of working with smaller particle sizes and lower pressure drops (leading to reduction of power consumption).

A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected. The lithographic component can be heated or, alternatively the walls of the enclosure can be cooled to establish a temperature gradient between the surface of the lithographic component and the walls of the enclosure, thereby enabling the thermophoretic force that resists particle deposition.

Method for protection of lithographic components from particle contamination

A thermophoretic vacuum wand that is particularly suited for transporting articles in a cleanroom environment so that potential particle contaminants in the air do not become adhered to the surface of the article is described. The wand includes a housing having a platen with a front surface with suction port(s) through the platen; a vacuum source for applying a negative pressure to the suction port(s); and heating device for the object. Heating the article when it is held by the vacuum wand affords thermophoretic protection that effectively prevents particles in the air from depositing onto the article.

Thermophoretic vacuum wand

An opposed-flow virtual cyclone for aerosol collation which can accurately collect, classify, and concentrate (enrich) particles in a specific size range. The opposed-flow virtual cyclone is a variation on the virtual cyclone and has its inherent advantages (no-impact particle separation in a simple geometry), while providing a more robust design for concentrating particles in a flow-through type system. The opposed-flow virtual cyclone consists of two geometrically similar virtual cyclones arranged such that their inlet jets are inwardly directed and symmetrically opposed relative to a plane of symmetry located between the two inlet slits. A top plate bounds both jets on the 'top' side of the inlets, while the other or lower wall curves 'down' and away from each inlet jet. Each inlet jet will follow the adjacent lower wall as it turns away, and that particles will be transferred away from the wall and towards the symmetry plane by centrifugal action. After turning, the two jets merge smoothly along the symmetry line and flow parallel to it through the throat. Particles are transferred from the main flows, across a dividing streamline, and into a central recirculating region, where particle concentrations become greatly increased relative to the main stream.

Opposed-flow virtual cyclone for particle concentration

Protection of lithographic components from particle contamination

A method of reducing particle deposition during the fabrication of microelectronic circuitry is presented. Reduction of particle deposition is accomplished by controlling the relative temperatures of various parts of the deposition system so that a large temperature gradient near the surface on which fabrication is taking place exists. This temperature gradient acts to repel particles from that surface, thereby producing cleaner surfaces, and thus obtaining higher yields from a given microelectronic fabrication process.

Reduction of particle deposition on substrates using temperature

An apparatus for determining particle properties from detected light scattered by the particles. The apparatus uses a light beam with novel intensity characteristics to discriminate between particles that pass through the beam and those that pass through an edge of the beam. The apparatus can also discriminate between light scattered by one particle and light scattered by multiple particles. The particle's size can be determined from the intensity of the light scattered. The particle's velocity can be determined from the elapsed time between various intensities of the light scattered.

Growing community of inventors

Albuquerque, NM, United States of America

Daniel John Rader