The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2009

Filed:

Sep. 17, 2002
Applicants:

Leonard Elliott Klebanoff, Dublin, CA (US);

Daniel John Rader, Albuquerque, NM (US);

Christopher Walton, Berkeley, CA (US);

James Folta, Livermore, CA (US);

Inventors:

Leonard Elliott Klebanoff, Dublin, CA (US);

Daniel John Rader, Albuquerque, NM (US);

Christopher Walton, Berkeley, CA (US);

James Folta, Livermore, CA (US);

Assignee:

EUV LLC, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 45/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

An efficient device for capturing fast moving particles has an adhesive particle shield that includes (i) a mounting panel and (ii) a film that is attached to the mounting panel wherein the outer surface of the film has an adhesive coating disposed thereon to capture particles contacting the outer surface. The shield can be employed to maintain a substantially particle free environment such as in photolithographic systems having critical surfaces, such as wafers, masks, and optics and in the tools used to make these components, that are sensitive to particle contamination. The shield can be portable to be positioned in hard-to-reach areas of a photolithography machine. The adhesive particle shield can incorporate cooling means to attract particles via the thermophoresis effect.


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