Company Filing History:
Years Active: 2001-2002
Title: Avijit K Ray-Chaudhuri: Innovator in Extreme-UV Lithography
Introduction
Avijit K Ray-Chaudhuri is a prominent inventor based in Livermore, California. He has made significant contributions to the field of extreme-ultraviolet (EUV) lithography, holding a total of seven patents. His work focuses on enhancing the quality and efficiency of lithographic processes, which are crucial in semiconductor manufacturing.
Latest Patents
Among his latest patents is the "Low thermal distortion extreme-UV lithography reticle." This innovation addresses the thermal distortion of reticles or masks by employing emissivity engineering. By selectively placing or omitting coatings on the reticle, the reflective reticles exhibit improved heat transfer, thereby reducing thermal distortion. This ultimately enhances the quality of the transcription of the reticle pattern onto the wafer. The reflective reticles consist of a substrate with an active region defining the mask pattern and non-active regions characterized by a higher emissivity surface than the active region. The non-active regions are intentionally left uncoated with radiation reflective material.
Another notable patent is the "Low thermal distortion Extreme-UV lithography reticle and method," which shares similar principles and aims to improve the lithographic process by minimizing thermal distortion through innovative engineering techniques.
Career Highlights
Avijit K Ray-Chaudhuri is currently associated with EUV LLC, where he continues to push the boundaries of lithography technology. His expertise and innovative mindset have positioned him as a key player in the semiconductor industry.
Collaborations
He has collaborated with notable colleagues, including Steven E Gianoulakis and Michael P Kanouff, contributing to advancements in their shared field of expertise.
Conclusion
Avijit K Ray-Chaudhuri's work in extreme-UV lithography represents a significant advancement in semiconductor manufacturing technology. His innovative patents and collaborations highlight his commitment to improving lithographic processes, making him a valuable contributor to the industry.
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