The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2001
Filed:
Jul. 13, 2000
Applicant:
Inventors:
William C. Sweatt, Albuquerque, NM (US);
Avijit Ray-Chaudhuri, Livermore, CA (US);
Assignee:
EUV LLC, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/08 ; G02B 5/18 ; G02B 5/10 ; G03B 2/754 ; G21K 5/00 ;
U.S. Cl.
CPC ...
G02B 5/08 ; G02B 5/18 ; G02B 5/10 ; G03B 2/754 ; G21K 5/00 ;
Abstract
Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.