Location History:
- Livermore, CA (US) (1985 - 2005)
- San Ramon, CA (US) (1999 - 2006)
Company Filing History:
5 out of 75 
2 out of 15,475 
2 out of 6 
Years Active: 1985-2006
Title: The Innovative Contributions of Donald W. Sweeney
Introduction
Donald W. Sweeney is a prominent inventor based in San Ramon, California, known for his significant contributions to the field of lithography. With a total of 10 patents to his name, Sweeney has made remarkable advancements in the technology used for manufacturing semiconductors.
Latest Patents
Among his latest patents is a groundbreaking method for EUV lithography reticles fabricated without the use of a patterned absorber. This innovative approach eliminates the conventional absorber material by introducing direct modulation in the complex-valued reflectance of the multilayer. A focused electron or ion beam is utilized to directly write a reticle pattern onto the reflective multilayer coating. This method not only avoids the traditional process steps associated with depositing and patterning an absorber layer but also provides high spatial resolution control over the phase and amplitude of the reflected field. Another notable patent involves a method for the manufacture of phase-shifting masks for EUV lithography. This method includes a substrate with a thin film multilayer coating that has a complex-valued reflectance, allowing for the introduction of phase-shifting features through alterations in the coating's thickness.
Career Highlights
Sweeney has had a distinguished career, working with notable organizations such as EUV LLC and the University of California. His work has significantly impacted the field of lithography, particularly in the development of advanced techniques for semiconductor manufacturing.
Collaborations
Throughout his career, Sweeney has collaborated with esteemed colleagues, including Daniel G. Stearns and Paul B. Mirkarimi. These collaborations have further enhanced his contributions to the field and fostered innovation in lithography technology.
Conclusion
Donald W. Sweeney's innovative work in lithography has led to significant advancements in semiconductor manufacturing. His patents reflect a deep understanding of complex technologies and a commitment to pushing the boundaries of what is possible in the field.