The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Sep. 27, 2002
Daniel G. Stearns, Los Altos, CA (US);
Donald W. Sweeney, San Ramon, CA (US);
Paul B. Mirkarimi, Sunol, CA (US);
Anton Barty, Livermore, CA (US);
Daniel G. Stearns, Los Altos, CA (US);
Donald W. Sweeney, San Ramon, CA (US);
Paul B. Mirkarimi, Sunol, CA (US);
Anton Barty, Livermore, CA (US);
EUV Limited Liability Corporation, Santa Clara, CA (US);
Abstract
A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.