For the Inventor, By the Inventor

Enter assignee name

Round Rock, TX, United States of America

Dupont Photomasks, Inc.

USPTO Granted Patents = 38

Forward Citations = 882

Loading Chart...

Loading Chart...

39 inventors (with patents filed for the assignee):

Franklin Dean Kalk (9 out of 11 patents)

Joseph Stephen Gordon (7 out of 10 patents)

Micha Oren (5 out of 6 patents)

4. Gregory P Hughes (4 out of 7 patents)

5. Dan Rittman (4 out of 4 patents)

6. Glenn Edward Storm (4 out of 4 patents)

7. Graham S Plows (3 out of 3 patents)

8. Adam Woolfe (3 out of 3 patents)

9. Andreas Englisch (3 out of 3 patents)

10. Michael J Penberth (3 out of 5 patents)

11. Xiaoming Chen (2 out of 5 patents)

12. Laurent Dieu (2 out of 4 patents)

13. Danny Rittman (2 out of 3 patents)

14. Gérald Galan (2 out of 2 patents)

15. Craig A West (2 out of 2 patents)

38 patents: Sort by Forward Citations

1. 7101645 - Reflective mask for short wavelength lithography (2006-09-05),

2. 6941006 - Method and system for calibrating the scan amplitude of an electron beam lithography instrument (2005-09-06),

3. 6911283 - Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism (2005-06-28),

4. 6907587 - System and method for correcting connectivity errors in a mask layout file (2005-06-14),

5. 6904582 - Photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured with the same (2005-06-07),

6. 6899981 - Photomask and method for detecting violations in a mask pattern file using a manufacturing rule (2005-05-31),

7. 6894766 - Method for constructing a photomask assembly using an encoded mark (2005-05-17),

8. 6893780 - Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern (2005-05-17),

9. 6877144 - System and method for generating a mask layout file to reduce power supply voltage fluctuations in an integrated circuit (2005-04-05),

10. 6861181 - Photomask and method for evaluating an initial calibration for a scanning electron microscope (2005-03-01),

11. 6850858 - Method and apparatus for calibrating a metrology tool (2005-02-01),

12. 6844119 - Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask (2005-01-18),

13. 6841312 - Method and apparatus for coupling a pellicle assembly to a photomask (2005-01-11),

14. 6841309 - Damage resistant photomask construction (2005-01-11),

15. 6833222 - Method and apparatus for trimming a pellicle film using a laser (2004-12-21),

DuPont Photomasks, Inc. is a leading global supplier of advanced photomasks and related services to the semiconductor industry. With over 50 years of experience, the company offers a wide range of high-quality photomasks, including binary, phase-shift, and advanced lithography masks. DuPont Photomasks provides innovative solutions to enable the manufacture of state-of-the-art electronic devices, collaborating with customers to meet their specific needs for yield improvement, reduced manufacturing times, and cost efficiency.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 2 2025

38 Patents

#6 in Round Rock, TX

#500 in Texas

#8,716 in US

#17,275 in the World

Round Rock, TX, United States of America

Dupont Photomasks, Inc.

Forward Citations = 882

39 inventors:

Franklin Dean Kalk (9 out of 11 patents)

Joseph Stephen Gordon (7 out of 10 patents)

Micha Oren (5 out of 6 patents)

4. Gregory P Hughes (4 out of 7 patents)

5. Dan Rittman (4 out of 4 patents)

Please report any incorrect information to support@idiyas.com

Loading…