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Round Rock, TX, United States of America

Dupont Photomasks, Inc.

Calculating rank

USPTO Granted Patents = 38

% Expired Patents = 57.9

Forward Citations = 888

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39 inventors (with patents filed for the assignee):

Franklin Dean Kalk (9 out of 11 patents)

Joseph Stephen Gordon (7 out of 10 patents)

Micha Oren (5 out of 6 patents)

4. Gregory P Hughes (4 out of 7 patents)

5. Dan Rittman (4 out of 4 patents)

6. Glenn Edward Storm (4 out of 4 patents)

7. Graham S Plows (3 out of 3 patents)

8. Adam Woolfe (3 out of 3 patents)

9. Andreas Englisch (3 out of 3 patents)

10. Michael J Penberth (3 out of 5 patents)

11. Xiaoming Chen (2 out of 5 patents)

12. Laurent Dieu (2 out of 4 patents)

13. Danny Rittman (2 out of 3 patents)

14. Gérald Galan (2 out of 2 patents)

15. Craig A West (2 out of 2 patents)

Core Competencies:

Reflective Mask

Electron Beam Lithography

Photomask Assembly

Calibration Method

Halftone Phase Shift

Design Rule Violations

ESD Protection

Pellicle Coupling

Mask Layout

Integrated Circuit

Damage Resistant

Multi-Tone Photomask

38 patents: Sort by Forward Citations

1. 7101645 - Reflective mask for short wavelength lithography (2006-09-05),

2. 6941006 - Method and system for calibrating the scan amplitude of an electron beam lithography instrument (2005-09-06),

3. 6911283 - Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism (2005-06-28),

4. 6907587 - System and method for correcting connectivity errors in a mask layout file (2005-06-14),

5. 6904582 - Photomask for reducing power supply voltage fluctuations in an integrated circuit and integrated circuit manufactured with the same (2005-06-07),

6. 6899981 - Photomask and method for detecting violations in a mask pattern file using a manufacturing rule (2005-05-31),

7. 6894766 - Method for constructing a photomask assembly using an encoded mark (2005-05-17),

8. 6893780 - Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern (2005-05-17),

9. 6877144 - System and method for generating a mask layout file to reduce power supply voltage fluctuations in an integrated circuit (2005-04-05),

10. 6861181 - Photomask and method for evaluating an initial calibration for a scanning electron microscope (2005-03-01),

11. 6850858 - Method and apparatus for calibrating a metrology tool (2005-02-01),

12. 6844119 - Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask (2005-01-18),

13. 6841312 - Method and apparatus for coupling a pellicle assembly to a photomask (2005-01-11),

14. 6841309 - Damage resistant photomask construction (2005-01-11),

15. 6833222 - Method and apparatus for trimming a pellicle film using a laser (2004-12-21),

Company Overview

Dupont Photomasks, Inc., located in Round Rock, Texas, specializes in the development and manufacturing of photomasks used in the semiconductor fabrication process. These photomasks are critical components that enable the production of integrated circuits by transferring circuit patterns onto silicon wafers. The company focuses on advanced technologies that support the evolving demands of the microelectronics industry, providing solutions that enhance performance and efficiency in semiconductor manufacturing.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

38 Patents

#9 in Round Rock, TX

#502 in Texas

#9,035 in US

#17,870 in the World

Round Rock, TX, United States of America

Dupont Photomasks, Inc.

Forward Citations = 888

39 inventors:

Franklin Dean Kalk (9 out of 11 patents)

Joseph Stephen Gordon (7 out of 10 patents)

Micha Oren (5 out of 6 patents)

4. Gregory P Hughes (4 out of 7 patents)

5. Dan Rittman (4 out of 4 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Dupont Photomasks, Inc.. Retrieved from https://idiyas.com/company/dupont-photomasks

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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