The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Jan. 11, 2002
H. Ufuk Alpay, Poughquag, NY (US);
Joseph S. Gordon, Gardiner, NY (US);
Gregory P. Hughes, Austin, TX (US);
Franklin D. Kalk, Austin, TX (US);
H. Ufuk Alpay, Poughquag, NY (US);
Joseph S. Gordon, Gardiner, NY (US);
Gregory P. Hughes, Austin, TX (US);
Franklin D. Kalk, Austin, TX (US);
DuPont Photomasks, Inc., Round Rock, TX (US);
Abstract
A method for fabricating a damage resistant photomask includes forming a photomask pattern on a substrate and forming a transparent, protective coating on the photomask pattern. The protective coating may be an electrical insulator (e.g., spin-on glass). In addition, an antireflective layer may be applied to the protective coating. A pellicle may also be attached over the protective coating. The protective coating may prevent electrostatic energy from forming on or arcing between features on the photomask pattern and damaging the features. The protective layer may also prevent the photomask pattern from being damaged by or reacting with other substances, such as cleaning solutions.