The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Mar. 03, 2003
Danny Rittman, Sunnyvale, CA (US);
Micha Oren, Cupertino, CA (US);
Danny Rittman, Sunnyvale, CA (US);
Micha Oren, Cupertino, CA (US);
DuPont Photomasks, Inc., Round Rock, TX (US);
Abstract
A system and method for generating a mask layout file to reduce power supply voltage fluctuations in an integrated circuit are disclosed. The method includes analyzing a pattern in a mask layout file to identify a region in the pattern to add one or more decoupling capacitors. Once the region is identified, a feature located in the identified region is moved based on a design rule from a first position to a second position in the mask layout file to create a space in the identified region. The decoupling capacitors are automatically placed in the space in the identified region.