Sunnyvale, CA, United States of America

Danny Rittman


Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 679(Granted Patents)


Company Filing History:


Years Active: 2005

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3 patents (USPTO):Explore Patents

Title: Danny Rittman - A Visionary Inventor Shaping the Future of Technology

Introduction:

Danny Rittman, a renowned inventor based in Sunnyvale, CA, is a beacon of inspiration for aspiring inventors worldwide. With a dedication to innovation and a relentless pursuit of excellence, he continues to push boundaries in the technological landscape.

Latest Patents:

Rittman's latest patents showcase his ingenuity and expertise in the field of integrated circuits. His inventions include a "Photomask for eliminating antenna effects in an integrated circuit" and a "Photomask for reducing power supply voltage fluctuations in an integrated circuit." These patents highlight his profound understanding of complex technical challenges and his ability to develop innovative solutions.

Career Highlights:

Throughout his career, Rittman has made significant contributions to the industry. He has worked with esteemed companies such as Dupont Photomasks, Inc. and Toppan Photomasks, Inc., where he honed his skills and expertise in semiconductor technologies. His portfolio of 3 patents demonstrates his commitment to advancing the field of integrated circuits.

Collaborations:

Rittman's collaborations with industry professionals, including his coworker Micha Oren, have further enriched his innovative endeavors. Working alongside experts in the field has allowed him to leverage diverse perspectives and collective knowledge to drive groundbreaking innovations.

Conclusion:

Danny Rittman's legacy as a visionary inventor is cemented by his impactful patents and enduring influence on the technological landscape. His dedication to innovation and passion for pushing boundaries continue to inspire the next generation of inventors, ensuring that his contributions will shape the future of technology for years to come.

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