For the Inventor, By the Inventor

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Round Rock, TX, United States of America

Toppan Photomasks, Inc.

USPTO Granted Patents = 17

% Expired Patents = 64.7

EPO Patents = 1

Forward Citations = 311

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25 inventors (with patents filed for the assignee):

David S Cummins (4 out of 4 patents)

Curt A Jackson (4 out of 4 patents)

James N Cook, Jr (4 out of 4 patents)

4. Gregory P Hughes (3 out of 7 patents)

5. Joseph Stephen Gordon (3 out of 10 patents)

6. Xun Zhang (2 out of 2 patents)

7. Janice M Paduano (2 out of 2 patents)

8. Xiaoming Chen (2 out of 5 patents)

9. Julio R Reyes (2 out of 2 patents)

10. Jeffry S Schepp (2 out of 3 patents)

11. Jan E Gentry (2 out of 3 patents)

12. Thomas T Cogdell (2 out of 3 patents)

13. Franklin Dean Kalk (2 out of 11 patents)

14. Kent Nakagawa (1 out of 1 patent)

15. Ethan M Frye (1 out of 1 patent)

17 patents: Sort by Forward Citations

1. 8833723 - Apparatus for transport of equipment and method for manufacture thereof (2014-09-16),

2. 8833722 - Apparatus for transport of equipment and method for manufacture thereof (2014-09-16),

3. 8347793 - Apparatus for transport of equipment and method for manufacture thereof (2013-01-08),

4. 8172194 - Apparatus for transport of equipment and method for manufacture thereof (2012-05-08),

5. 7906350 - Method for calibrating a metrology tool (2011-03-15),

6. 7663156 - Method and apparatus for calibrating a metrology tool (2010-02-16),

7. 7531275 - Photomask assembly and method for protecting the same from contaminants generated during a lithography process (2009-05-12),

8. 7425393 - Phase shift photomask and method for improving printability of a structure on a wafer (2008-09-16),

9. 7398509 - Network-based photomask data entry interface and instruction generator for manufacturing photomasks (2008-07-08),

10. 7277159 - System and method for automatically mounting a pellicle assembly on a photomask (2007-10-02),

11. 7271950 - Apparatus and method for optimizing a pellicle for off-axis transmission of light (2007-09-18),

12. 7094505 - Photomask assembly and method for protecting the same from contaminants generated during a lithography process (2006-08-22),

13. 7056623 - Photomask and method for manufacturing the same (2006-06-06),

14. 6978437 - Photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufacture with same (2005-12-20),

15. 6968530 - Network-based photomask data entry interface and instruction generator for manufacturing photomasks (2005-11-22),

Toppan Photomasks, Inc., based in Round Rock, Texas, specializes in the development and manufacturing of photomasks essential for semiconductor fabrication. The company focuses on advanced photomask technologies that support the production of integrated circuits, enabling innovations in various electronic devices. With a commitment to quality and precision, Toppan Photomasks plays a critical role in the semiconductor supply chain, catering to a global clientele in the ever-evolving tech landscape.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

Toppan Photomasks, Inc.

17 Patents

#13 in Round Rock, TX

#1,146 in Texas

#18,865 in US

#35,857 in the World

Round Rock, TX, United States of America

Toppan Photomasks, Inc.

Forward Citations = 311

25 inventors:

David S Cummins (4 out of 4 patents)

Curt A Jackson (4 out of 4 patents)

James N Cook, Jr (4 out of 4 patents)

4. Gregory P Hughes (3 out of 7 patents)

5. Joseph Stephen Gordon (3 out of 10 patents)

Please report any incorrect information to [email protected]

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