Company Filing History:
Years Active: 2008
Title: The Innovative Contributions of Kent Nakagawa
Introduction
Kent Nakagawa, a prominent inventor based in Beaverton, Oregon, has made significant contributions to the field of photomasks. With a keen focus on enhancing printability during lithography processes, Nakagawa's work is pivotal in the advancement of semiconductor manufacturing technologies.
Latest Patents
Kent Nakagawa holds a patent for a "Phase Shift Photomask and Method for Improving Printability of a Structure on a Wafer." This innovative patent details a methodology that includes providing a photomask featuring a zero-degree phase shift wafer (PSW) on the top surface and a 180-degree PSW in a specified first region. Furthermore, the invention includes an orthogonal PSW in a second region that enhances the projection of increased radiant energy intensity during lithography. This patent is crucial for improving the accuracy and efficiency of semiconductor fabrication processes.
Career Highlights
Kent Nakagawa is currently associated with Toppan Photomasks, Inc., a leading company specializing in advanced lithography solutions. His role within the organization has allowed him to focus on the development of cutting-edge technologies that address the challenges faced in the industry. His commitment to innovation is evident in his approach to complex problems, demonstrating a blend of technical expertise and creativity.
Collaborations
Throughout his career, Nakagawa has engaged in various collaborations with industry leaders and research institutions to further enhance the applications of photomasks in semiconductor processing. These partnerships have enabled him to leverage collective knowledge and skill sets, contributing to the evolution of lithography techniques and their practical implementations.
Conclusion
Kent Nakagawa stands out as a notable inventor in the realm of semiconductor technologies, with a noteworthy patent that showcases his innovative spirit and technical acumen. His contributions at Toppan Photomasks, Inc. and his collaborations with other industry players underscore his pivotal role in advancing the field of photomasks and lithography. As technology continues to evolve, Nakagawa's work will undoubtedly have a lasting impact on semiconductor manufacturing.