Company Filing History:
Years Active: 2006-2009
Title: Innovations of Xun Zhang in Photomask Technology
Introduction
Xun Zhang, an accomplished inventor based in Wappingers Falls, NY, has made significant contributions to the field of photomask technology. With two patents to his name, he focuses on enhancing lithography processes crucial in various high-tech manufacturing environments. His innovative work has been recognized and utilized in advancing the capabilities of photomask assemblies.
Latest Patents
Among his notable patents, the most recent is a comprehensive design for a photomask assembly along with a method for protecting it from contaminants generated during lithography processes. This invention introduces a pellicle assembly, encompassing a pellicle frame and a pellicle film attached to its first surface. The pellicle frame features both an inner and outer wall, establishing a secure environment for the photomask, which is mounted on the opposite surface of the frame. A critical aspect of this invention is the incorporation of a molecular sieve that effectively prevents airborne molecular contaminants (AMCs) from reaching the photomask, thereby ensuring the integrity and quality of the lithography process.
Career Highlights
Xun Zhang is currently associated with Toppan Photomasks, Inc., a leading company in the photomask manufacturing sector. Here, he has played an integral role in developing technologies that improve the efficiency and effectiveness of photomask applications. His work demonstrates a blend of creativity and practical engineering skills, positioning him as a key contributor in his field.
Collaborations
Throughout his career, Xun has collaborated with talented individuals in the industry, including his coworkers Joseph Stephen Gordon and Janice M. Paduano. These partnerships have further advanced the research and development efforts at Toppan Photomasks, Inc., fostering an environment of innovation and shared knowledge.
Conclusion
Xun Zhang's dedication to innovation within photomask technology is evident through his patents and contributions at Toppan Photomasks, Inc. His work not only enhances the lithography processes but also sets a new benchmark for photomask assemblies, showcasing the essential role of inventors in driving technological progress. As industries continue to evolve, the significance of such innovations will undoubtedly grow, highlighting the importance of inventors like Xun Zhang in shaping the future.