The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Oct. 29, 2003
Xun Zhang, Wappingers Falls, NY (US);
Joseph Stephen Gordon, Gardiner, NY (US);
Janice M. Paduano, Hyde Park, NY (US);
Xiaoming Chen, Austin, TX (US);
Julio R. Reyes, Cedar Park, TX (US);
Xun Zhang, Wappingers Falls, NY (US);
Joseph Stephen Gordon, Gardiner, NY (US);
Janice M. Paduano, Hyde Park, NY (US);
Xiaoming Chen, Austin, TX (US);
Julio R. Reyes, Cedar Park, TX (US);
Toppan Photomasks, Inc., Round Rock, TX (US);
Abstract
A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.