Company Filing History:
Years Active: 2006-2009
Title: **Innovative Contributions of Inventor Julio R. Reyes from Cedar Park, TX**
Introduction
Julio R. Reyes is a notable inventor hailing from Cedar Park, Texas. With a remarkable portfolio of 2 patents, his contributions significantly impact the field of lithography and photomask technology. His inventive approach showcases the intersection of creativity and practical application in advanced manufacturing processes.
Latest Patents
One of Julio R. Reyes's latest patents focuses on a "Photomask assembly and method for protecting the same from contaminants generated during a lithography process." This innovative design incorporates a pellicle assembly, which consists of a pellicle frame and a pellicle film. The pellicle frame has an inner wall and an outer wall, ensuring the photomask is securely coupled to a second surface opposite the pellicle film. A defining feature of this invention is the inclusion of a molecular sieve, which effectively prevents airborne molecular contaminants (AMCs) generated during lithography processes from compromising the integrity of the photomask.
Career Highlights
Julio currently works with Toppan Photomasks, Inc., a prominent company that specializes in the design and manufacturing of photomasks. His role at Toppan has allowed him to merge his inventive skills with technological advancements, contributing to innovative solutions in the industry.
Collaborations
Throughout his career, Julio has collaborated with several talented individuals, including colleagues Xun Zhang and Joseph Stephen Gordon. Their joint efforts in research and development have further propelled innovations in the photomask domain, showcasing the importance of teamwork in achieving groundbreaking results.
Conclusion
Julio R. Reyes exemplifies the spirit of innovation within the engineering and technology sectors. His patents continue to play a crucial role in enhancing the processes involved in lithography, showcasing how inventive minds like his are pivotal for technological advancement. As he continues his work at Toppan Photomasks, Inc., the future holds the promise of more innovative contributions from this dedicated inventor.