Janice M Paduano

Title: Janice M Paduano: Innovator in Photomask Technology

Introduction

Janice M Paduano is a notable inventor based in Hyde Park, NY (US). She has made significant contributions to the field of photomask technology, holding two patents that enhance the efficiency and reliability of lithography processes.

Latest Patents

Her latest patent focuses on a photomask assembly and method for protecting the assembly from contaminants generated during a lithography process. This innovative assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame features an inner wall and an outer wall, with a photomask coupled to a second surface opposite the pellicle film. A molecular sieve is associated with the pellicle assembly, preventing airborne molecular contaminants (AMCs) from contaminating the photomask during the lithography process.

Career Highlights

Janice currently works at Toppan Photomasks, Inc., where she continues to develop cutting-edge solutions in photomask technology. Her work has been instrumental in advancing the capabilities of lithography, which is crucial for semiconductor manufacturing.

Collaborations

Throughout her career, Janice has collaborated with talented individuals such as Xun Zhang and Joseph Stephen Gordon. These partnerships have fostered innovation and contributed to the success of her projects.

Conclusion

Janice M Paduano's contributions to photomask technology exemplify her dedication to innovation in the field. Her patents reflect her commitment to improving lithography processes, making her a significant figure in the industry.