Company Filing History:
Years Active: 2003-2008
Title: The Innovative Mind of Jan E. Gentry
Introduction
Jan E. Gentry, an accomplished inventor based in Round Rock, Texas, has made significant contributions to the field of photomask manufacturing. With a remarkable portfolio that includes three patented inventions, she has utilized her expertise to improve industrial processes in the semiconductor industry.
Latest Patents
One of Jan's latest patents is the "Network-based photomask data entry interface and instruction generator for manufacturing photomasks." This invention introduces a computer network that efficiently generates manufacturing instructions for photomask equipment. It allows customers to input photomask specification data through a series of order entry screens downloaded to their computers, typically via an internet connection. The system validates this data and produces both fracturing instructions and equipment control instructions. These instructions, along with the pattern design data provided by customers, are sent to a fracture engine that creates fractured pattern data, which is then electronically delivered to the manufacturing equipment for production.
Career Highlights
Throughout her career, Jan has worked at prominent companies in the industry, including Toppan Photomasks, Inc. and DuPont Photomasks, Inc. Her work has been instrumental in streamlining the photomask creation process, making it more accessible and efficient for manufacturers.
Collaborations
Jan E. Gentry has collaborated with several professionals in her field, including notable coworkers Jeffry S. Schepp and Thomas T. Cogdell. These collaborations have allowed her to leverage collective expertise, fostering an environment of innovation and development in photomask technology.
Conclusion
Jan E. Gentry's contributions to the semiconductor industry through her innovative inventions demonstrate her role as a leading inventor. Her patents are paving the way for advancements in manufacturing processes, reflecting her dedication to enhancing efficiency and accuracy in the field. As she continues to innovate, Jan remains a pivotal figure in shaping the future of photomask manufacturing.