The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Nov. 08, 2002
Photomask and method for reducing electrostatic discharge on the same with an esd protection pattern
Applicants:
Gérald Galan, Boulogne Billancourt, FR;
Eric Souleillet, Pourrieres, FR;
Inventors:
Gérald Galan, Boulogne Billancourt, FR;
Eric Souleillet, Pourrieres, FR;
Assignee:
DuPont Photomasks, Inc., Round Rock, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ; A47G001/12 ;
U.S. Cl.
CPC ...
Abstract
A photomask and method for reducing electrostatic discharge on the photomask with an ESD protection pattern are disclosed. A photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer includes an electrostatic discharge (ESD) patterned formed between an outer perimeter of an active region and an inner perimeter of a frame region. The ESD pattern reduces ESD effects in the patterned layer.