The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6899981 B1

PDF
Full Text
Expired
Date of Patent:
May. 31, 2005

Filed:

Nov. 21, 2002
Applicants:

Gérald Galan, Boulogne Billancourt, FR;

Gérard Auligine, Pourrières, FR;

Inventors:

Gérald Galan, Boulogne Billancourt, FR;

Gérard Auligine, Pourrières, FR;

Assignee:

DuPont Photomasks, Inc., Round Rock, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ;
U.S. Cl.
CPC ...
Abstract

A photomask and method for detecting failures in a mask pattern file using a manufacturing rule are disclosed. The method includes calculating a manufacturing rule based on a design parameter associated with a manufacturing process and measuring a dimension of a non-linear feature in a mask pattern file. A rule violation is identified in the mask pattern file if the measured dimension is less than the calculated manufacturing rule.


Find Patent Forward Citations

Galan, Gérald. (2005). Photomask and method for detecting violations in a mask pattern file using a manufacturing rule (U.S. Patent No. 6899981). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6899981

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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