Gérard Auligine

Title: Gérard Auligine: Innovator in Photomask Technology

Introduction

Gérard Auligine is a notable inventor based in Pourrières, France. He has made significant contributions to the field of photomask technology, particularly through his innovative patent that addresses critical aspects of mask pattern file integrity.

Latest Patents

Auligine holds a patent for a "Photomask and method for detecting violations in a mask pattern file using a manufacturing rule." This invention discloses a method that calculates a manufacturing rule based on design parameters associated with a manufacturing process. It involves measuring the dimensions of non-linear features in a mask pattern file. If the measured dimension is found to be less than the calculated manufacturing rule, a rule violation is identified in the mask pattern file. This innovation is crucial for ensuring the accuracy and reliability of photomasks used in various manufacturing processes.

Career Highlights

Gérard Auligine has built a career at Dupont Photomasks, Inc., where he has been instrumental in advancing photomask technology. His work has contributed to the development of more efficient manufacturing processes in the semiconductor industry. Auligine's expertise in this area has made him a valuable asset to his company and the industry as a whole.

Collaborations

Auligine has worked alongside his coworker, Gérald Galan, contributing to various projects that enhance the capabilities of photomask technology. Their collaboration has focused on improving the precision and reliability of manufacturing processes.

Conclusion

Gérard Auligine's contributions to photomask technology through his innovative patent demonstrate his commitment to advancing the field. His work at Dupont Photomasks, Inc. highlights the importance of innovation in manufacturing processes.