For the Inventor, By the Inventor

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Center Valley, PA, United States of America

Avantor Performance Materials, Inc.

USPTO Granted Patents = 20

% Expired Patents = 40.0

CIPO Patents = 5

EPO Patents = 16

Trademarks = 43

Forward Citations = 37

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26 inventors (with patents filed for the assignee):

Glenn Westwood (6 out of 7 patents)

Chien-Pin Sherman Hsu (4 out of 11 patents)

William R Gemmill (3 out of 3 patents)

4. Seiji Inaoka (3 out of 4 patents)

5. Sean Michael Kane (3 out of 5 patents)

6. Raymond Albertus Johannes Ten Broeke (1 out of 2 patents)

7. Chun-Yi Sam Chiu (1 out of 1 patent)

8. Mi Yeon Oh (1 out of 1 patent)

9. Chu-Hung Wade Wei (1 out of 1 patent)

10. Jianhua Liu (1 out of 2 patents)

11. James Roque Darlucio (1 out of 1 patent)

12. James Michael Lambert (1 out of 3 patents)

13. Nicolas Hildenbrand (1 out of 1 patent)

14. Joannes Theodorus Valentinus Hoogboom (1 out of 1 patent)

15. Michiel Scheffer (1 out of 1 patent)

20 patents: Sort by Forward Citations

1. 12649907 - Alternate detergents for viral inactivation (2026-06-09),

2. 11661258 - Packaging system for storage and shipment of solids (2023-05-30),

3. 11319513 - Non-aqueous tungsten compatible metal nitride selective etchants and cleaners (2022-05-03),

4. 10961391 - Curable organopolysiloxane composition containing dynamic covalent polysiloxane (2021-03-30),

5. 10133180 - Microelectronic substrate cleaning compositions having copper/azole polymer inhibition (2018-11-20),

6. 9570343 - Rinsing solution to prevent TiN pattern collapse (2017-02-14),

7. 9327966 - Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-K dielectrics (2016-05-03),

8. 8986559 - Compositions and methods for texturing polycrystalline silicon wafers (2015-03-24),

9. 8906838 - Microelectronic cleaning and arc remover compositions (2014-12-09),

10. 8557757 - Multipurpose acidic, organic solvent based microelectronic cleaning composition (2013-10-15),

11. 8497233 - Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers (2013-07-30),

12. 8481472 - Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition (2013-07-09),

13. 8338350 - Gluconic acid containing photoresist cleaning composition for multi-metal device processing (2012-12-25),

14. 8183195 - Peroxide activated oxometalate based formulations for removal of etch residue (2012-05-22),

15. 8178482 - Cleaning compositions for microelectronic substrates (2012-05-15),

Avantor Performance Materials, Inc. specializes in the development and manufacturing of high-performance materials for various industries, including life sciences, pharmaceuticals, and advanced technologies. The company focuses on providing innovative solutions that enhance research and production processes, ensuring quality and efficiency in laboratory and manufacturing environments. Headquartered in Center Valley, PA, Avantor serves a global market, emphasizing its commitment to advancing scientific discovery and operational excellence.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

20 Patents

#3 in Center Valley, PA

#606 in Pennsylvania

#16,382 in US

#31,233 in the World

Center Valley, PA, United States of America

Avantor Performance Materials, Inc.

Forward Citations = 37

26 inventors:

Glenn Westwood (6 out of 7 patents)

Chien-Pin Sherman Hsu (4 out of 11 patents)

William R Gemmill (3 out of 3 patents)

4. Seiji Inaoka (3 out of 4 patents)

5. Sean Michael Kane (3 out of 5 patents)

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