Company Filing History:
Years Active: 2022
Title: Mi Yeon Oh: Innovator in Microelectronics Cleaning Chemistry
Introduction
Mi Yeon Oh is a prominent inventor based in Center Valley, PA (US). She has made significant contributions to the field of microelectronics through her innovative patent. Her work focuses on developing cleaning chemistries that enhance the efficiency and compatibility of microelectronic processes.
Latest Patents
Mi Yeon Oh holds a patent for "Non-aqueous tungsten compatible metal nitride selective etchants and cleaners." This invention introduces a novel acidic fluoride activated cleaning chemistry. The present invention includes unique organic-solvent based microelectronic selective etchant and cleaner compositions that exhibit high metal nitride etch and broad compatibility, particularly with tungsten (W) and low-k materials. Notably, her formulation avoids the use of W-incompatible oxidizers, such as hydrogen peroxide, and does not generate particle-producing corrosion inhibitors.
Career Highlights
Mi Yeon Oh is currently employed at Avantor Performance Materials, Inc. Her role involves advancing cleaning technologies that are crucial for the microelectronics industry. Her innovative approach has positioned her as a key player in the development of effective cleaning solutions.
Collaborations
Mi Yeon Oh collaborates with esteemed colleagues, including Chien-Pin Sherman Hsu and Chun-Yi Sam Chiu. These partnerships enhance her research and development efforts, contributing to the advancement of microelectronic cleaning technologies.
Conclusion
Mi Yeon Oh's contributions to the field of microelectronics through her innovative patent demonstrate her expertise and commitment to advancing cleaning chemistries. Her work continues to impact the industry positively.