The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Mar. 23, 2017
Applicant:
Avantor Performance Materials, Llc, Center Valley, PA (US);
Inventors:
Chien-Pin Sherman Hsu, Berkeley Heights, NJ (US);
Chun-Yi Sam Chiu, Center Valley, PA (US);
Chu-Hung Wade Wei, Center Valley, PA (US);
Mi Yeon Oh, Center Valley, PA (US);
Assignee:
AVANTOR PERFORMANCE MATERIALS, LLC, Center Valley, PA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); C11D 7/50 (2006.01); B08B 3/08 (2006.01); C09K 13/10 (2006.01); C11D 7/08 (2006.01); C11D 7/26 (2006.01); C11D 7/32 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 7/5022 (2013.01); B08B 3/08 (2013.01); C09K 13/08 (2013.01); C09K 13/10 (2013.01); C11D 7/08 (2013.01); C11D 7/261 (2013.01); C11D 7/265 (2013.01); C11D 7/3218 (2013.01); C11D 11/0047 (2013.01); H01L 21/02057 (2013.01);
Abstract
Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.