Location History:
- Lyndhurst, OH (US) (2010 - 2011)
- Bethlehem, PA (US) (2010 - 2012)
Company Filing History:
Years Active: 2010-2012
Title: The Innovative Contributions of Sean Michael Kane
Introduction
Sean Michael Kane is a notable inventor based in Lyndhurst, OH (US), recognized for his significant contributions to the field of microelectronics. With a total of five patents to his name, Kane has developed innovative cleaning compositions that enhance the efficiency and effectiveness of microelectronic substrate processing.
Latest Patents
Kane's latest patents include a stripping and cleaning composition specifically designed for microelectronic substrates. This composition comprises at least one organic stripping solvent, a nucleophilic amine, and a non-nitrogen containing weak acid, which is crucial for achieving an aqueous pH between 9.6 and 10.9. Additionally, it contains a metal-removing compound, such as diethylene glycol, and water, providing a comprehensive solution for cleaning microelectronics. Another significant patent focuses on compositions for cleaning ion-implanted photoresist in front end of line applications. This composition includes an organic stripping solvent, fluoride ions, an acidifying agent, and water, with the option of incorporating an oxidizing agent.
Career Highlights
Throughout his career, Sean Michael Kane has worked with prominent companies in the industry, including Avantor Performance Materials, Inc. and Mallinckrodt Baker, Inc. His experience in these organizations has allowed him to refine his expertise in developing innovative cleaning solutions for microelectronics.
Collaborations
Kane has collaborated with notable professionals in his field, including Joseph M. Ilardi and David C. Skee. These collaborations have contributed to the advancement of his research and the successful development of his patented compositions.
Conclusion
Sean Michael Kane's innovative work in the field of microelectronics has led to the creation of valuable cleaning compositions that address critical challenges in the industry. His contributions continue to impact the efficiency of microelectronic substrate processing.