Company Filing History:
Years Active: 2010-2012
Title: Seiji Inaoka: Innovator in Microelectronic Cleaning Compositions
Introduction
Seiji Inaoka is a notable inventor based in Nazareth, Pennsylvania, who has made significant contributions to the field of microelectronics. With a total of four patents to his name, he has developed innovative solutions that address critical challenges in the cleaning of microelectronic devices.
Latest Patents
Among his latest patents is a "Gluconic acid containing photoresist cleaning composition for multi-metal device processing." This invention provides a microelectronic photoresist cleaning composition that effectively cleans multi-metal microelectronic devices without causing substantial galvanic corrosion during subsequent rinsing steps with water. Another significant patent is for "Non-aqueous, non-corrosive microelectronic cleaning compositions." This invention offers back-end photoresist strippers and cleaning compositions that are amino acid-free and non-aqueous, ensuring they are non-corrosive towards copper and aluminum. The composition includes at least one polar organic solvent, one hydroxylated organic amine, and a corrosion inhibitor compound with multiple hydroxyl functional groups.
Career Highlights
Seiji Inaoka has worked with prominent companies in the industry, including Avantor Performance Materials, Inc. and Mallinckrodt Baker, Inc. His experience in these organizations has allowed him to refine his expertise in microelectronic cleaning technologies.
Collaborations
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Conclusion
Seiji Inaoka's innovative work in microelectronic cleaning compositions showcases his commitment to advancing technology in this critical field. His patents reflect a deep understanding of the challenges faced in microelectronics and provide effective solutions that enhance device processing.