The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2011

Filed:

Feb. 25, 2005
Applicant:

Seiji Inaoka, Nazareth, PA (US);

Inventor:

Seiji Inaoka, Nazareth, PA (US);

Assignee:

Avantor Performance Materials, Inc., Phillipsburg, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/42 (2006.01); C11D 7/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

Back end photoresist strippers and cleaning compositions of this invention are provided by amino acid-free, non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor compound with multiple hydroxyl functional groups that is a compound of the formula:T-[(CRR)—(CRR)]—(CRR)-Twhere at least one of Rand ROH and if one of Rand Ris not OH, it is selected from H, alkyl or alkoxy, m is a whole integer of 1 or greater, Rand Rare selected from H, alkyl or alkoxy, n is 0 or a greater whole positive integer, p is a whole integer of 1 or greater; at least one of Rand Ris OH and if one of Rand Ris not OH, it is selected from H, alkyl or alkoxy, q is a whole integer of 1 or greater; Tand Tare selected from H, alkyl, hydroxyalkyl, polyhydroxyalkyl, aminoalkyl, carbonylalkyl or amide groups or Tand Tmay be connected forming a structure selected from an aliphatic cyclic or fused cyclic structure.


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