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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9327966 B1

PDFFull Text
Date of Patent:
May. 03, 2016

Filed:

May. 31, 2012

Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-k dielectrics

Applicants:

William R. Gemmill, Bethlehem, PA (US);

Glenn Westwood, Edison, NJ (US);

Inventors:

William R. Gemmill, Bethlehem, PA (US);

Glenn Westwood, Edison, NJ (US);

Assignee:

AVANTOR PERFORMANCE MATERIALS, INC., Center Valley, PA (US);

Attorney:

Hoffmann & Baron, LLP

Primary Examiner:

Stephanie Duclair

Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); C09K 13/00 (2006.01); C09K 13/02 (2006.01); B81C 1/00 (2006.01); C11D 3/00 (2006.01); C11D 3/20 (2006.01); C11D 3/28 (2006.01); C11D 3/30 (2006.01); C11D 11/00 (2006.01); G03F 7/42 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); C08J 7/12 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00539 (2013.01); C08J 7/12 (2013.01); C09K 13/00 (2013.01); C11D 3/0073 (2013.01); C11D 3/2044 (2013.01); C11D 3/2058 (2013.01); C11D 3/2068 (2013.01); C11D 3/28 (2013.01); C11D 3/30 (2013.01); C11D 11/0047 (2013.01); G03F 7/425 (2013.01); H01L 21/02057 (2013.01); H01L 21/31133 (2013.01);
Abstract

A composition is provided that is effective for removing post etch treatment (PET) polymeric films and photoresist from semiconductor substrates. The composition exhibits excellent polymer film removal capability while maintaining compatibility with copper and low-κ dielectrics and contains water, ethylene glycol, a glycol ether solvent, morpholinopropylamine and a corrosion inhibiting compound and optionally one or more metal ion chelating agent, one or more other polar organic solvent, one or more tertiary amine, one or more aluminum corrosion inhibition agent, and one or more surfactant.

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