Company Filing History:

15 out of 10,295

Tokyo Electron Limited

patents

1 out of 52,711

Kabushiki Kaisha Toshiba

patents

3 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 2000-2023

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17 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11705313 - Inspection method and plasma processing apparatus (2023-07-18),

2. 11183374 - Wastage determination method and plasma processing apparatus (2021-11-23),

3. 10763089 - Wastage determination method and plasma processing apparatus (2020-09-01),

4. 10290476 - Plasma processing method and plasma processing apparatus (2019-05-14),

5. 10068778 - Plasma processing method and plasma processing apparatus (2018-09-04),

6. 8975191 - Plasma etching method (2015-03-10),

7. 8975188 - Plasma etching method (2015-03-10),

8. 8821683 - Substrate processing apparatus and method, and program and storage medium (2014-09-02),

9. 8716144 - Method for manufacturing semiconductor device (2014-05-06),

10. 8664117 - Method for manufacturing semiconductor device using anisotropic etching (2014-03-04),

11. 8558134 - Plasma processing apparatus and plasma processing method (2013-10-15),

12. 8114245 - Plasma etching device (2012-02-14),

13. 7682978 - Plasma processing method and high-rate plasma etching apparatus (2010-03-23),

14. 7628931 - Processing method for conservation of processing gases (2009-12-08),

15. 7405162 - Etching method and computer-readable storage medium (2008-07-29),

Title: Yusuke Hirayama: Innovator in Plasma Processing Technology

Introduction

Yusuke Hirayama is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 17 patents. His innovative work focuses on improving inspection methods and wastage determination in plasma processing apparatuses.

Latest Patents

Hirayama's latest patents include an inspection method and a plasma processing apparatus. The inspection method involves monitoring the power of a reflected wave from a power wave supplied by a source power supply for plasma generation. This method allows for the measurement of fluctuations in peak-to-peak voltage at the lower electrode of the substrate support within the chamber. Additionally, he has developed a wastage determination method that utilizes an optical emission spectrometer to measure light emission intensities of radicals in the plasma. This technology helps in determining the wastage rate of expendable parts in the chamber.

Career Highlights

Throughout his career, Yusuke Hirayama has worked with notable companies, including Tokyo Electron Limited. His expertise in plasma processing has positioned him as a key figure in advancing technologies that enhance efficiency and accuracy in manufacturing processes.

Collaborations

Hirayama has collaborated with several professionals in his field, including Masaki Hirayama and Haruyuki Takano. These collaborations have contributed to the development of innovative solutions in plasma processing technology.

Conclusion

Yusuke Hirayama's contributions to plasma processing technology through his patents and collaborations highlight his role as a leading inventor in this field. His work continues to influence advancements in manufacturing processes and inspection methods.

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1 patent (EPO):

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