The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Nov. 26, 2002
Tadahiro Ohmi, Miyagi-ken, JP;
Masaki Hirayama, Miyagi-ken, JP;
Haruyuki Takano, Hiyagi-ken, JP;
Yusuke Hirayama, Yamanashi-ken, JP;
Tadahiro Ohmi, Miyagi-ken, JP;
Masaki Hirayama, Miyagi-ken, JP;
Haruyuki Takano, Hiyagi-ken, JP;
Yusuke Hirayama, Yamanashi-ken, JP;
Other;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma etching device which has an auxiliary electrode enabling realization of a uniform plasma density of generated plasma on the surface of a base and which enables uniform etching with respect to the base without depending upon pressure and without rotating a magnetic field applying means. The plasma etching device has magnetic field applying means which has two parallel plate electrodes I and II and RF power applying means, with the base set on the electrode I, and which is horizontal and unidirectional with respect to the surface of the base where plasma etching is carried out. In this plasma etching device, an auxiliary electrode is provided at least on the upstream side of the base in a flow of electron current generated by the magnetic field applying means. The auxiliary electrode includes a local electrode arranged on the side facing the electrode II and means for adjusting impedance provided at a part of the local electrode to be electrically connected with the electrode I.