Yun Shen Chang

Title: The Innovative Contributions of Yun Shen Chang

Introduction

Yun Shen Chang is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 18 patents. His work has been instrumental in advancing the methods used in semiconductor device structures.

Latest Patents

Chang's latest patents include a method for forming a semiconductor device structure with a conductive line. This method involves several intricate steps, such as forming a first mask layer over a dielectric layer, which includes a first trench with specific inner walls and bottom surfaces. Additionally, the process incorporates the formation of an anti-bombardment layer and a second mask layer, ultimately leading to the creation of a conductive structure within a third trench in the dielectric layer. This innovative approach enhances the efficiency and reliability of semiconductor devices.

Career Highlights

Throughout his career, Yun Shen Chang has worked with notable companies in the semiconductor industry, including Macronix International Co., Ltd. and Taiwan Semiconductor Manufacturing Company. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Chang has collaborated with esteemed colleagues such as Chin-Yi Huang and Samuel C. Pan. These partnerships have fostered a creative environment that has led to the development of innovative solutions in the semiconductor field.

Conclusion

Yun Shen Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices, showcasing the importance of innovation in technology.