Location History:
- Taipei, TW (2016)
- Hsin-Chu, TW (2017)
- New Taipei, TW (2014 - 2020)
Company Filing History:
Years Active: 2014-2020
Title: Profile of Yuan-Chih Chu: Innovator in Lithography Technology
Introduction: Yuan-Chih Chu is a prominent inventor based in New Taipei, Taiwan. With a remarkable portfolio of 23 patents, he has made significant contributions to the field of semiconductor manufacturing. His innovative approaches have helped advance lithography technology, crucial for the development and production of integrated circuits.
Latest Patents: Among Yuan-Chih Chu's latest inventions is the "Method to Fabricate Mask-Pellicle System." This method involves fabricating a pellicle assembly for lithography processes by providing a carrier, creating a membrane layer over it, and attaching a pellicle frame. The carrier is then separated using a release treatment process. Another noteworthy patent is "Photomask and Fabrication Method Therefor," which outlines a process of manufacturing a mask by sequentially depositing various layers and removing portions to expose specific areas. These innovations reflect his deep understanding of complex manufacturing processes.
Career Highlights: Yuan-Chih Chu is a valued employee at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading semiconductor manufacturer renowned for its cutting-edge technology. His work has not only resulted in numerous patents but has also been instrumental in enhancing the efficiency and effectiveness of lithography techniques in the production of semiconductors.
Collaborations: Throughout his career, Yuan-Chih Chu has collaborated with talented colleagues such as Hsun-Chuan Shih and Yen-Kai Huang. These collaborations have fostered a culture of innovation and creativity, enabling his team to push the boundaries of semiconductor technology.
Conclusion: Yuan-Chih Chu stands out as a key figure in the semiconductor industry, with his extensive patent portfolio showcasing his inventive spirit and commitment to technological advancement. His contributions continue to influence the evolution of lithography processes, establishing him as an esteemed inventor in the field.