The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Mar. 12, 2014
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Yuan-Chih Chu, New Taipei, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
Some embodiments of the present disclosure relate to a method for repairing a photomask pattern, comprising receiving a photomask with a first translucent material formed on a transparent substrate, which forms an incomplete version of the photomask pattern. Missing portions of the photomask pattern are detected by comparing the incomplete version of the photomask pattern to a complete version of the photomask pattern. After detecting the missing portions, the photomask pattern is completed by using a second translucent material, which is different than the first translucent material, to form the missing portions. The second translucent exhibits the same transmissive property as the first translucent material. Consequently, both the repaired and unrepaired portions of the pattern have the same transmissive properties with respect to attenuation and phase shifting of incident radiation to enhance pattern resolution in the repaired portion of the photomask pattern.