The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2020
Filed:
Apr. 06, 2017
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Hao-Ming Chang, Hsinchu, TW;
Chien-Hung Lai, Taichung, TW;
Cheng-Ming Lin, Siluo Township, TW;
Hsuan-Wen Wang, Hsinchu, TW;
Min-An Yang, Taichung, TW;
S. C. Hsu, Sijhih, TW;
Shao-Chi Wei, Hsinchu, TW;
Yuan-Chih Chu, New Taipei, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.