Hsin-Chu, Taiwan

Yuan-Chang Huang


Average Co-Inventor Count = 2.4

ph-index = 12

Forward Citations = 391(Granted Patents)


Location History:

  • Miao Li Hsien, TW (2000)
  • Miao Li, TW (2001)
  • Hsin-Chu, TW (1996 - 2005)

Company Filing History:


Years Active: 1996-2005

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34 patents (USPTO):Explore Patents

Title: Innovations by Yuan-Chang Huang in Semiconductor Technology

Introduction

Yuan-Chang Huang, located in Hsin-Chu, Taiwan, is a prominent inventor in the field of semiconductor technology, holding an impressive total of 34 patents. His work focuses on enhancing the performance and efficiency of NMOS and PMOS transistors, which are vital components in modern electronic devices.

Latest Patents

Among his latest patents is a groundbreaking method that employs a temporary self-aligned stop layer applied on silicon sidewalls. This innovative approach enables the formation of NMOS and PMOS transistors with ultra-shallow source/drain regions featuring high dopant concentrations. The process includes the sequential formation of first sidewall spacers and nitride spacers on the gate electrode, followed by creating a self-aligned oxide etch stop layer. The removal of the nitride spacer allows for the deposition of an amorphous silicon layer, facilitating a controlled etch to produce silicon sidewalls.

Another notable patent is related to an anti-type dosage as an LDD implant, which provides a method for turning off MOS transistors through an anti-code LDD implant. This method eliminates the necessity for high energy implants that can damage the poly gate, making it a significant advancement in the field. The implementation can be part of a Flash-ROM process applicable to both polycide and silicide procedures.

Career Highlights

Yuan-Chang Huang’s innovative contributions have led him to work at the Taiwan Semiconductor Manufacturing Company, a leading entity in the semiconductor industry. His expertise in semiconductor fabrication processes has positioned him as a key figure in his organization, facilitating advancements that contribute to the increasingly complex requirements of modern electronics.

Collaborations

Throughout his career, Yuan-Chang has collaborated with talented coworkers, including Li-Chih Chao and Shu-Ying Cho. These collaborations have likely fostered an environment of innovation, driving their collective efforts to enhance semiconductor technology further.

Conclusion

With a significant number of patents to his credit, Yuan-Chang Huang continues to make remarkable contributions to the semiconductor field. His latest innovative methods not only improve transistor performance but also pave the way for more efficient electronic devices in the future. As he continues his career at the Taiwan Semiconductor Manufacturing Company, his work will undoubtedly impact the technological landscape significantly.

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