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For the Inventor, By the Inventor

Tama, Japan

Yoshimitsu Kodaira

USPTO Granted Patents = 12


Average Co-Inventor Count = 3.1

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Kawasaki, JP (2009 - 2018)
  • Kanagawa, JP (2019)
  • Tama, JP (2011 - 2020)

Company Filing History:

goldMedal12 out of 355 
 
Canon Anelva Corporation
 patents

Years Active: 2009-2020

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12 patents (USPTO):Explore Patents
1. 10685815 - Plasma processing apparatus and device manufacturing method (2020-06-16),
2. 10546720 - Ion beam processing device (2020-01-28),
3. 10388491 - Ion beam etching method of magnetic film and ion beam etching apparatus (2019-08-20),
4. 10026591 - Method for manufacturing semiconductor device, ion beam etching device, and control device (2018-07-17),
5. 9984854 - Ion beam processing method and ion beam processing apparatus (2018-05-29),
6. 9773973 - Process for producing magnetoresistive effect element and device producing method (2017-09-26),
7. 9734989 - Method for manufacturing semiconductor device, ion beam etching device, and control device (2017-08-15),
8. 9640754 - Process for producing magnetoresistive effect element (2017-05-02),
9. 9190287 - Method of fabricating fin FET and method of fabricating device (2015-11-17),
10. 8540852 - Method and apparatus for manufacturing magnetoresistive devices (2013-09-24),
11. 7981805 - Method for manufacturing resistance change element (2011-07-19),
12. RE40951 - Dry etching method for magnetic material (2009-11-09),

Title: The Innovative Mind of Yoshimitsu Kodaira

Introduction

Yoshimitsu Kodaira, an accomplished inventor from Tama, Japan, has made significant contributions to the fields of plasma processing and ion beam technology. With a remarkable portfolio of 12 patents, his work has advanced methods of manufacturing devices, particularly in reducing damage from plasma and improving processing techniques for fine patterns.

Latest Patents

Kodaira's latest inventions demonstrate his innovative approach to enhancing manufacturing processes. His patent for a **Plasma Processing Apparatus and Device Manufacturing Method** addresses the need for improved durability in discharge vessels used in plasma processing. This apparatus includes a processing chamber, a discharge vessel designed to minimize damage from plasma, an antenna generating an induced electric field, and an electromagnet forming a divergent magnetic field, all aimed at lengthening the discharge vessel's replacement cycle.

Another noteworthy patent is his **Ion Beam Processing Device**, which aims to refine the processing method and apparatus used for etching fine patterns. This invention allows for a greater etching amount of ion beams in the extending directions of pattern trenches, effectively minimizing the deposition of redeposited films, which can interfere with the processing of fine features on substrates.

Career Highlights

Kodaira has had a distinguished career at Canon Anelva Corporation, where he has been instrumental in advancing technological solutions within the company. His dedication to innovation in plasma and ion beam processing has garnered recognition among peers and industry leaders alike.

Collaborations

Throughout his career, Kodaira has worked alongside talented colleagues such as Yukito Nakagawa and Motozo Kurita. This collaborative environment has fostered an exchange of ideas and expertise, further enhancing the innovative capabilities of their projects.

Conclusion

Yoshimitsu Kodaira continues to push the boundaries of innovation in his field. With a robust portfolio of patents and a commitment to enhancing manufacturing processes, he is an exemplary figure in the realm of inventors. His contributions not only improve existing technologies but also pave the way for future advancements in plasma processing and ion beam technology.

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