The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Sep. 13, 2006
Naoki Watanabe, Kawasaki, JP;
Yoshimitsu Kodaira, Kawasaki, JP;
David D. Djayaprawira, Kawasaki, JP;
Hiroki Maehara, Kawasaki, JP;
Naoki Watanabe, Kawasaki, JP;
Yoshimitsu Kodaira, Kawasaki, JP;
David D. Djayaprawira, Kawasaki, JP;
Hiroki Maehara, Kawasaki, JP;
Canon Anelva Corporation, Kawasaki-Shi, Kanagawa, JP;
Abstract
Disclosed are method and apparatus for manufacturing a magnetoresistive device which are suitable for manufacturing a high-quality magnetoresistive device by reducing damages caused during the processing of a multilayer magnetic film as a component of the magnetoresistive device, thereby preventing deterioration of magnetic characteristics due to such damages. Specifically disclosed is a method for manufacturing a magnetoresistive device, which includes processing a multilayer magnetic film by performing a reactive ion etching on a substrate which is provided with the multilayer magnetic film as a component of the magnetoresistive device. This method for manufacturing a magnetoresistive device includes irradiating the multilayer magnetic film with an ion beam after the reactive ion etching.