The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2020
Filed:
Aug. 25, 2010
Ryo Matsuhashi, Eden Prairie, MN (US);
Hiroshi Akasaka, Kawasaki, JP;
Yoshimitsu Kodaira, Tama, JP;
Atsushi Sekiguchi, Hino, JP;
Naoko Matsui, Machida, JP;
Ryo Matsuhashi, Eden Prairie, MN (US);
Hiroshi Akasaka, Kawasaki, JP;
Yoshimitsu Kodaira, Tama, JP;
Atsushi Sekiguchi, Hino, JP;
Naoko Matsui, Machida, JP;
CANON ANELVA CORPORATION, Kawasaki-shi, JP;
Abstract
The present invention provides a plasma processing apparatus which reduces damage from plasma generated in a discharge vessel and lengthens the replacement cycle of the discharge vessel. A plasma processing apparatusis provided with a processing chamberpartitioning a processing space, a discharge vesselwhose one end opens facing inside the processing chamberand the other end is closed, an antennawhich is disposed around the discharge vesseland generates an induced electric field to generate plasma in the discharge vesselunder reduced pressure, and an electromagnetwhich is arranged around the discharge vesseland forms a divergent magnetic field in the discharge vessel. The discharge vesselhas at its closed end portion a protrusionprojecting toward the processing chamber