Machida, Japan

Naoko Matsui


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013-2020

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Naoko Matsui: Innovator in Plasma Processing and Magneto-Resistance Technology

Introduction

Naoko Matsui is a prominent inventor based in Machida, Japan. She has made significant contributions to the fields of plasma processing and magneto-resistance technology. With a total of 2 patents, her work has advanced the capabilities of manufacturing processes in these areas.

Latest Patents

Matsui's latest patents include a plasma processing apparatus and a device manufacturing method. The plasma processing apparatus is designed to reduce damage from plasma generated in a discharge vessel while extending the replacement cycle of the discharge vessel. This innovative apparatus features a processing chamber that partitions a processing space, a discharge vessel with one end open to the processing chamber, and an antenna that generates an induced electric field to create plasma under reduced pressure. Additionally, an electromagnet forms a divergent magnetic field within the discharge vessel, enhancing its functionality.

The manufacturing method of a magneto-resistance effect element focuses on improving the step coverage of a formed film while allowing for low-temperature deposition. This method involves forming an insulating protective layer on a multilayered structure using a plasma CVD apparatus. The design separates the plasma source from the film deposition chamber, enabling the protective layer to be deposited without degrading magnetic characteristics, even at temperatures below 150°C.

Career Highlights

Naoko Matsui has established herself as a key figure in her field through her innovative patents and contributions to technology. Her work at Canon Anelva Corporation has positioned her as a leader in the development of advanced manufacturing techniques.

Collaborations

Matsui has collaborated with notable colleagues, including Hiroshi Akasaka and Eiji Ozaki. These partnerships have further enriched her research and development efforts.

Conclusion

Naoko Matsui's contributions to plasma processing and magneto-resistance technology exemplify her innovative spirit and dedication to advancing manufacturing processes. Her patents reflect her commitment to improving technology and enhancing efficiency in her field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…