Introduction: Atsushi Sekiguchi, based in Tokyo, JP, is a prominent inventor known for his significant contributions to wafer processing technology. With an impressive portfolio of 34 patents, Sekiguchi has been instrumental in advancing techniques that enhance the efficiency and efficacy of semiconductor manufacturing.

Latest Patents: Among his latest innovations, Sekiguchi developed a wafer processing method and a plasma processing apparatus. The wafer processing method involves irradiating a wafer placed on a sample table within a processing chamber. This technique utilizes light or electromagnetic waves to heat and remove a compound layer from a film layer on the wafer’s surface. Sekiguchi’s method accurately detects changes in intensity of the reflected light, enabling precise adjustments for optimal processing outcomes. His plasma processing apparatus performs plasma etching on wafers featuring multilayer films that alternate insulating films with metal-containing films. This apparatus strategically controls the etching process while determining the endpoint based on light spectrum analysis from the reflected waves.

Career Highlights: Sekiguchi's career is marked by his tenures at leading companies such as Anelva Corporation and Dai Nippon Printing Co., Ltd. These roles allowed him to pioneer advancements in semiconductor manufacturing and contribute to innovative solutions in the field.

Collaborations: Throughout his career, Atsushi Sekiguchi has collaborated with notable professionals, including Kenji Ueda and Tsuyoshi Hotta. Their joint efforts have provided a platform for developing and refining innovative technologies that push the boundaries of wafer processing.

Conclusion: Atsushi Sekiguchi stands out as a key figure in the realm of semiconductor innovation. His 34 patents demonstrate not only his inventive prowess but also his commitment to advancing the industry through groundbreaking technologies. As the demand for efficient semiconductor processing continues to grow, Sekiguchi's contributions will undoubtedly play a crucial role in shaping the future of this vital field.

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