The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2002
Filed:
Mar. 03, 2000
Applicant:
Inventors:
Assignee:
Anelva Corporation, Fuchu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 8/00 ;
U.S. Cl.
CPC ...
C23C 8/00 ;
Abstract
A method of manufacturing a titanium nitride thin film at the surface of a substrate the chemical vapor deposition method (CVD method) includes supplying trakisdialkylamino titanium (TDAAT and ammonia into a reaction vessel, and heating it a prescribed temperature under a low pressure of less than 100 Pa total pressure, wherein the partial pressure P of the source-material gas is set in a range of 0<P /P <10 with respect to the partial pressure P of the added ammonia gas.