Kawasaki, Japan

Hiroshi Akasaka


Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 10(Granted Patents)


Location History:

  • Saitama, JP (2013)
  • Kawasaki, JP (2017 - 2020)

Company Filing History:


Years Active: 2013-2020

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5 patents (USPTO):Explore Patents

Title: Hiroshi Akasaka: Innovator in Plasma Processing Technology

Introduction

Hiroshi Akasaka is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses and methods.

Latest Patents

Akasaka's latest patents include a plasma processing apparatus and a device manufacturing method. This invention aims to reduce damage from plasma generated in a discharge vessel while extending the replacement cycle of the discharge vessel. The apparatus features a processing chamber that partitions a processing space, a discharge vessel with one end open to the processing chamber, and an antenna that generates an induced electric field to create plasma under reduced pressure. Additionally, an electromagnet forms a divergent magnetic field within the discharge vessel, enhancing the overall functionality of the device.

Another notable patent is the ion beam etching method and ion beam etching apparatus. This invention enables a highly uniform ion beam etching process even under low-angle-incident static conditions, without increasing the size of the apparatus. The method involves changing the position of an opening portion relative to a substrate, etching the substrate with an ion beam, and reducing the tilt angle as the center of the site where the ion beam is incident moves away from the ion source.

Career Highlights

Hiroshi Akasaka is currently employed at Canon Anelva Corporation, where he continues to innovate and develop advanced technologies in plasma processing. His expertise and dedication to his field have made him a valuable asset to the company.

Collaborations

Akasaka has collaborated with notable colleagues, including Yasushi Kamiya and Naoko Matsui. Their combined efforts contribute to the advancement of technology in their respective fields.

Conclusion

Hiroshi Akasaka's contributions to plasma processing technology through his innovative patents demonstrate his commitment to advancing the field. His work not only enhances device manufacturing methods but also sets a foundation for future developments in plasma processing.

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