The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2009

Filed:

Jun. 11, 2008
Applicants:

Yoshimitsu Kodaira, Kawasaki, JP;

Taichi Hiromi, Kawasaki, JP;

Inventors:

Yoshimitsu Kodaira, Kawasaki, JP;

Taichi Hiromi, Kawasaki, JP;

Assignee:

Canon Anelva Corporation, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/44 (2005.12);
U.S. Cl.
CPC ...
Abstract

A dry etching method in which a plasma of an etching gas is generated and a magnetic material is dry-etched using a mask material made of a non-organic material, wherein an alcohol having at least one hydroxyl group is used as the etching gas. The alcohol used as the etching gas has one hydroxyl group such as an alcohol selected from the group including methanol (CHOH), ethanol (CHOH) and propanol (CHOH).


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